Dow Electronic Materials


Connectivity provides insights into the materials that are enabling the next generation of electronic devices. Keep your edge with the latest information about recent developments, our product portfolio, and opinions and viewpoints from our industry experts.

Showing all articles related to Photoresist

James Thackeray Named SPIE Fellow

April 13, 2017

James Thackeray, Ph.D., new SPIE Fellow

Dr. Thackeray has been named a SPIE Fellow for his many achievements in lithography materials development over the past decade, many of which have contributed to enabling Moore’s law.

Read More

Peter Trefonas, 2016 Perkin Medal Recipient, Credits Chemistry for Enabling the Information Age

September 26, 2016


Peter Trefonas, Ph.D., received the Society of Chemical Industry (SCI) Perkin Medal on September 13, 2016, recognized as the highest honor given for outstanding work in applied chemistry in the United States. At the award ceremony, Trefonas spoke to how chemistry innovations enabled the Information Age.

Read More

The State of EUV Lithography: A Materials Primer

July 19, 2016

Photo of James W. Thackeray, Ph.D.

Extreme ultraviolet (EUV) lithography is the most promising of the post-optical lithography patterning technologies to enable continued shrink, keeping the semiconductor industry on the path of Moore’s law. Dow’s two Litho University℠ video tutorials on EUV are a great place to start learning the fundamentals of EUV technology.

Read More

Dow’s Litho Technologies Team Recognized by Fairchild Semiconductor

June 20, 2016

Group of people standing together with a Dow Chemical Company logo in the background

Dow Electronic Materials has been recognized as Fairchild Semiconductor's Chemical Supplier of the Year for its materials and service for the microlithography process. The award was recently presented to representatives from Dow’s Litho Technologies team in Marlborough, MA.

Read More

Dow’s Litho and CMP Teams to Present at CSTIC 2016

March 02, 2016

CSTIC 2016 will be held in Shanghai

Dow is a proud participant in this year’s CSTIC conference, where we will present papers about some of our recent work in lithography and chemical mechanical planarization (CMP) technology. The conference will be held March 13-14, 2016 in conjunction with SEMICON China in Shanghai.

Read More

Learn from Dow’s Experts at SPIE Lithography

January 26, 2016

Conference attendees listen to expert presenters

The 2016 SPIE Advanced Lithography Conference will be held February 21-25, 2016 in San Jose, CA. The Dow team will be presenting four sessions and one poster presentation as part of the Advances in Patterning Materials and Processes conference track, and we hope to see you there!

Read More